Based upon guidance provided by the University System of Georgia, all Georgia Tech sponsored events through June 30, including athletics competitions, are cancelled, postponed or will move to a virtual format.


Thursday, May 7 2020
11:00am - 12:00pm
Online Webinar - BlueJeans
N/A
For more information:

Contact for More Information About this Series: 
Dr. Paul Joseph: Principal Research Scientist & SENIC External User Coordinator

Institute for Electronics & Nanotechnology, Georgia Institute of Technology

paul.joseph@ien.gatech.edu

 

Contact for More Information About Research News & Events at IEN:
Ms. Christa Ernst: Research Communications Program Manager

Institute for Electronics and Nanotechnology & Institute for Materials, Georgia Institute of Technology
christa.ernst@ien.gatech.edu

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SENIC Technical Webinar Series: Session 3 - Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology

May 7, 2020 | 11AM-12PM | SENIC Technical Webinar Series: Session 3 -  Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology

Devin K. Brown, Georgia Institute of Technology

The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech is hosting a series of online technical seminars, from 11am - 12pm, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research.

We invite you to join us at any of the lectures by registering at the link at the bottom of the page. On the registration form, please check the seminars for which you are interested (you are not limited in the number) so that appropriate accompanying materials, if needed, are prepared.

Abstract: The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution.   The Elionix electron beam lithography tools are known for ultra-high precision to fabricate small nano-structures with excellent reliability.  The ELS G-100 is capable of generating patterns with a line width of 5 nm.  A 20bit DAC provides high beam positioning resolution. In addition, the laser interferometer with its reading resolution of 0.31 nm enables a stitching accuracy of 15 nm and overlay accuracy of 20 nm.  The tool features a maximum field size of 1 mm and a scanning frequency of 100 MHz.  Sample sizes can be handled from small millimeter size pieces up to full 8” diameter wafers. This 30-minute webinar will provide an overview of the ELS-G100 system with a discussion of key features and capabilities followed by time for Q & A.  

Bio: Devin is currently a Senior Research Engineer in the Institute for Electronics and Nanotechnology.  He has held that position since 2002.  His research interests have included fabrication of nanoscale devices and nanoscale process development.  He is currently pursuing a PhD in electrical and computer engineering and his thesis is on nano-newton force transduction.  Prior to Georgia Tech, he was a Senior Yield Engineer at Intel Process Technology Development group in Hillsboro, Oregon from 1995 to 2002.  His positions there included managing an Ion Implant process module initially and then later front end transistor performance process development.  He graduated from Georgia Tech in 1995 with an MSEE and in 1993 with a BEE.

Who should attend: Faculty, scientists, engineers, researchers, and technical staff from university, company, or government labs who are interested in learning about how electron beam lithography capability might enable their research efforts. 

 

Join the Online Event May 7th at this link: https://bluejeans.com/237855794

Registration Link: https://tinyurl.com/IENexperts2

 

The other events are below....

May 14:   "Photolithography at GT-IEN: An Overview of Processes and Equipment"

May 21:    "Laser Micromachining at GT-IEN"
May 28:    "Etching at GT-IEN: A Review of Processes and Equipment"

Click images in enlarge.