Wednesday, August 14 2019
1:30pm - 2:30pm
Online Webinar
For more information:
Paul Joseph - External User Coordinator
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SENIC Webinar: Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
Devin K. Brown- Senior Research Engineer; Institute for Electronics & Nanotechnology, Georgia Institute of Technology


The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography tools are known for ultra-high precision to fabricate small nano-structures with excellent reliability. The ELS G-100 is capable of generating patterns with a line width of 5 nm. A 20bit DAC provides high beam positioning resolution. In addition, the laser interferometer with its reading resolution of 0.31 nm enables a stitching accuracy of 15 nm and overlay accuracy of 20 nm. The tool features a maximum field size of 1 mm and a scanning frequency of 100 MHz. Sample sizes can be handled from small millimeter size pieces up to full 8” diameter wafers.This 30-minute webinar will provide an overview of the ELS-G100 system with a discussion of key features and capabilities followed by time for Q & A.

Who should attend: Faculty, scientists, engineers, researchers, and technical staff from university, company, or government labs who are interested in learning about how electron beam lithography capability might enable their research efforts.